SURFACEstrip 715 is a highly-concentrated alkaline liquid designed to fully strip aqueous dry film, while leaving the base copper free of spots and oxidation for easy etching or A.O.I. or inspection. SURFACEstrip 715 also exhibits extremely low tin, tin-lead and copper attack rates, which makes for easy waste treatment.
SURFACEstrip 715 can be used in either spray or immersion applications

SURFACESTRIP™ 422 Aqueous Photoresist Stripper is a concentrated, alkaline liquid designed to be used to fully strip aqueous dry film, while leaving the underlayer copper free of spots and oxidation for easy A.O.I. inspection. SURFACESTRIP 422 can be used in either spray or immersion applications. SURFACESTRIP 422 is particularly effective as an outerlayer stripper because it completely removes the adhesion promoters sometimes incorporated into dry film photoresists.