AR 10 L
AR10L DUV Anti-Reflectant is an organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresists. It is designed to provide a universal anti- reflective surface for high- and low-temperature resist platforms and offers excellent compatibility with most ESCAP, HYBRID and Acetal resists. AR10L is a conformal 1st min. 248 nm anti-reflectant and is typically used in the range of 400–1,200Å over transparent thin films on reflective substrates. Due to the wide range of resist compatibility that AR10L offers it makes it an ideal candidate for a consolidation BARC product.
AR 14 L
AR14L DUV Anti-Reflectant is an organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF)
photoresists. It is designed to provide an anti-reflective surface for low-temperature resist platforms. AR14L is
available in various dilutions to accommodate varying topographic challenges.
AR602 is a developable organic bottom anti-reflectant for use in both KrF and ArF applications. AR602 is designed for improved performance of critical implant layers while minimizing the negative effects of other implant solutions. AR602 has excellent reflection control and improves profile and CDU concerns of a traditional top anti-reflectant coating (TARC). AR602 eliminates the need for a BARC open etch minimizing substrate damage and reducing additional process steps of a more traditional bottom anti-reflectant coating.
AR602 has been formulated to work as a system with a wide range of KrF and ArF photoresists. It also acts as a chemical barrier between photoresist and substrate, presenting a common substrate for all layers. AR602 has a tunable dissolution rate with cure temperature and photoresist profile can be optimized by cure temperature and develop time.
AR602 is available in one dilution: AR602-510 which is formulated for coatings in the range of 450 – 600Å over reflective substrates.