Ready-to-use Formulations for Thermal & Photo (UV) Nanoimprint Lithography (NIL)
• Coating of various substrates with excellent film quality
(Si, SiO2, glass, Al, Al2O3, plastics)
• Excellent pattern replication fidelity using various mold
materials (Si, SiO2, Ni, OrmoStamp®)
• Superior mold release properties
• Numerous application areas (pattern transfer using dry
etch processes, permanent applications)
• Customized solutions and resist formulations designed for
industrial high throughput processes
• Safe solvents specified for industrial requirements
• Guaranteed product quality and processing reproducibility
• Manufacturing according to ISO 9001 and ISO 14001