KMPR

  • KMPR

    Chemically Amplified Epoxy-based Negative Photoresist capable of 1-100um in a single-spin @ 3000rpm
     
    Material Attributes:

    • i-line processing
    • high aspect ratio with vertical sidewalls
    • Photo-definable ultra-thick structures
    • Outstanding thermal and chemical stability
    • Excellent etch resistance

     
    Applications:

    • MEMS
    • DRIE etch mask
    • Microfluidics
    • Optoelectronics
    • Displays