Solvents and GenSolv blends

KMG Electronic Chemicals produces high-purity solvents and other wet process chemicals under a concept we call “basic manufacturing.” As a basic manufacturer, we are vertically integrated to meet the stringent standards of semiconductor, silicon wafer, disk drive and other applications that need the coherent manufacturing, analytical and packaging capabilities of a single supplier. We supply solvents and solvent blends to many markets, including microelectronic, aerospace, biotechnology, pharmaceutical and optics, for such applications as:

  • Basic cleaning in semiconductor and related high-purity processes
  • Various etch-polishing processes
  • Ultra-low-residue vapor drying
  • Adhesion promoters for photoresists
  • Positive and negative photoresist stripping agents
  • Photoresist edge-bead-remover agents
  • High-purity intermediates for photoresist, spin-on-glass, low-k dielectric materials and anti-reflective coatings
  • Carriers for photoresist, abrasives, solvents and lubricants Coolants, wetting agents and thickeners.

Acetone

Acetone can be used for drying laboratory glassware, removing greasy or oily contaminants from work benches, or as a general photoresist stripper or edgebead remover.

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  • Acetone - ULSI
  • Acetone - VLSI
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Ethylene Glycol

Ethylene Glycol is a high purity process chemical for semiconductor rinse applications and in a high purity cooling system.

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  • Ethylene Glycol - VLSI
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Hexamethyldisilazane (HMDS)

Hexamethyldisilazane (HMDS) is an adhesion promoter between photoresist and the silicon wafer.

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  • HMDS - VLSI
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Isopropyl Alcohol

Isopropyl alcohol (IPA) is used in IPA vapor drying of wafers. The vapor dryer advantages over spin-rinse dryers include: no water spots, decreased particles on the wafer, reduced chemical consumption and much reduced wafer breakage.

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  • Isopropyl Alcohol - ULSI
  • Isopropyl Alcohol - VLSI
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Methanol

Methanol is a general cleaning solvent and is often a substitute for acetone due to its slower evaporation rate.

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  • Methanol - VLSI
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Methyl Ethyl Ketone (MEK)

Methyl ethyl ketone (MEK) is a strong solvent that is typically used as a negative photoresist remover.

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  • Methyl Ethyl Ketone (MEK) - VLSI
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n-Butyl Acetate

Butyl Acetate is used as a solvent in semiconductor processes. It is available in Cleanroom LP (Low Particle) bottles and drums.

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  • n-Butyl Acetate - VLSI
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n-Methypyrrolidone (NMP)

N-Methylpyrrolidone (NMP) is a safer alternative to many hazardous solvents. NMP can be used to remove photoresist, clean and dewax silicon wafers, and remove solder flux on printed circuit boards.

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  • n-Methylpyrrolidone (NMP) - VLSI
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n-Propanol

  • n-Propanol - VLSI
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PGMEA Thinner

  • PGMEA Thinner - VLSI
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