PMMA 950K / PMMA 495K / Co-Polymers

PMMA/Co-Polymers Positive Photoresists  for Electron Beam Processing

Material Attributes:

  • E-Beam and X-ray imageable
  • High resolution
  • Wide range of film thicknesses
  • Excellent adhesion to most substrates


Applications:

  • Direct-write E-Beam Lithography
  • T-gates
  • PHEMT
  • Temporary bonding
  • Metallisation

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  • PMMA
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