SU-8, SU-8 2000, SU-8 3000 & KMPR

KMPR

Chemically Amplified Epoxy-based Negative Photoresist capable of 1-100um in a single-spin @ 3000rpm
 
Material Attributes:

  • i-line processing
  • high aspect ratio with vertical sidewalls
  • Photo-definable ultra-thick structures
  • Outstanding thermal and chemical stability
  • Excellent etch resistance

 
Applications:

  • MEMS
  • DRIE etch mask
  • Microfluidics
  • Optoelectronics
  • Displays

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  • MCC SU8 50 - 100
  • MCC-SU8 2-25
  • MCC SU8 2000.5 - 2015
  • MCC SU8 2025 - 2075
  • MCC SU8 2100 - 2150
  • SU8 3000
  • KMPR Data Sheet ver 4.1.pdf

    KMPR 1000 i-line photoresist is a high contrast, epoxy based photoresist that can be developed in conventional aqueous alkaline developer (TMAH) and readily stripped from the wafer.

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