Developers
Product Name | Product Function |
MIBK:IPA 1:1 | High speed PMMA & copolymer resist development |
MIBK:IPA 1:2 | PMMA & copolymer resist development |
MIBK:IPA 1:3 | High resolution PMMA & copolymer resist development |
MicroChem 303 A Developer | Holographic lithography and general microelectronics |
MicroChem 452 Developer | Development of DuPont® S1800® and other commercially available photoresists |
MicroChem 455 Developer | Development of DuPont® S1800® and other commercially available photoresists |
PMGI 101 developer | PMGI resist development |
SU-8 developer | SU-8 & SU-8 2000 resist development |
MIBK:IPA 1:1, 1:2 & 1:3
MicroChem’s wide range of MIBK:IPA developer and rinse formulations are designed for high resolution, high throughput PMMA and copolymer resist processing. These developers are available in 4 liter packaging.
Benefits
- Optimized for PMMA, and copolymer resists
- Wide range of standard formulations
- Compatible with spray and immersion processes
- Sub 0.1μm resolution
You can only view the below documents if you are logged in, so login or register today.
-
PMMA and Copolymer Developer.pdf