Developers

Product Name Product Function
MIBK:IPA 1:1 High speed PMMA & copolymer resist development
MIBK:IPA 1:2 PMMA & copolymer resist development
MIBK:IPA 1:3 High resolution PMMA & copolymer resist development
MicroChem 303 A Developer Holographic lithography and general microelectronics
MicroChem 452 Developer Development of DuPont® S1800® and other commercially available photoresists
MicroChem 455 Developer Development of DuPont® S1800® and other commercially available photoresists
PMGI 101 developer PMGI resist development
SU-8 developer SU-8 & SU-8 2000 resist development

MIBK:IPA 1:1, 1:2 & 1:3

MicroChem’s wide range of MIBK:IPA developer and rinse formulations are designed for high resolution, high throughput PMMA and copolymer resist processing. These developers are available in 4 liter packaging.

Benefits

  • Optimized for PMMA, and copolymer resists
  • Wide range of standard formulations
  • Compatible with spray and immersion processes
  • Sub 0.1μm resolution

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  • PMMA and Copolymer Developer.pdf
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