REMOVER PG is a proprietary NMP based solvent stripper designed for efficient and complete removal of PMGI, PMMA, LOR, copolymer, KMPR® 1000, “minimally cross-linked” SU-8 and other resist films on Si, SiO2, GaAs, and many other substrate surfaces. It may also be used as a lift-off solvent.

Benefits 

• Compatible with automated lift-off equipment
• Clean, scum-free removal
• Universal remover/stripper for removal of all resist films
• Room temperature processing
• No chlorinated or fluorinated hydrocarbons

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