PMGI SF / LOR A / LOR B / LOR C
Resists for Bi-layer Lift-off Processing
Material Attributes:
- Won't intermix when over-coated with most imaging resists
- High thermal stability: Tg ~ 195oC
- Single step development of bi-layer stack in TMAH or KOH developers
- Removes quickly and cleanly in conventional resist strippers
- Enables sub 0.25µm micron bi-layer resist imaging
- Enables high yield, very thick (>3µm) metal lift-off processing
Applications:
- Data Storage
- III-V Semiconductors
- Optoelectronics
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KAM-LOR-PMGI-Datasheet-51820.pdf