SU-8, SU-8 2000, SU-8 3000, SU-8 TF 6000 & KMPR®

SU-8 Negative Epoxy Resists

 
Kayaku Advanced Materials, Inc. epoxy resists consist of chemically amplified, epoxy-based negative resists that are highly functional, and photo-imageable to near UV (365nm) radiation. Cured films or microstructures are very resistant to solvents, acids and bases and have excellent thermal and mechanical stability, making them well suited for fabricating permanent structures such as pixel walls, fluidic channels and nozzles, micro arrays and spacers.

Epoxy Resists Features UV
Sensitivity		 Film Thickness
(optimum)		 Resolution

SU-8
  • Wide range of viscosities
  • High aspect ratio patterning
  • Photo-definable ultra-thick structures
 i-line 10-200 µm >10:1 Aspect Ratio

SU-8 2000
  • Improved substrate wetting
  • Faster drying
  • Higher process throughput
 i-line 10-100 µm >10:1 Aspect Ratio

SU-8 3000
  • Improved substrate adhesion
  • Reduced coating stress
 i-line 10-70 µm >5:1 Aspect Ratio

SU-8 TF 6000
  • High resolution thin film processing
  • Highly uniform thin films
  • Improved substrate adhesion
 g-, h-, i-line 0.5-10 µm High resolution

KMPR® 1000 Negative Epoxy Resist

KMPR® 1000 i-Line resist is a high contrast, epoxy-based photoresist that can be developed in a conventional aqueous alkaline developer (TMAH) and more easily removed after normal processing. Its excellent adhesion and chemical and plasma resistance make it ideal for various MEMS, Electrolytic Plating and DRIE applications.

Epoxy Resists Features UV
Sensitivity		 Film Thickness
(optimum)		 Resolution

KMPR® 1000
  • Temporary or permanent applications
  • TMAH (0.26N) development
  • Electroplating and etch mask
 i-line 4-75 µm >5:1 Aspect Ratio

 

SU-8 and KMPR®

  • KAM-SU-8-2-25-Datasheet-9.3.20-final.pdf

    SU-8 is a high contrast, epoxy-based photoresist designed for micromachining and other microelectronic applications where a thick chemically and thermally stable image is desired. The exposed and subsequently cross-linked portions of the film are rendered insoluble to liquid developers. SU-8 has very high optical transparency above 360nm, which makes it ideally suited for imaging near vertical sidewalls in very thick films. SU-8 is best suited for permanent applications where it is imaged, cured and left in place.

  • KAM-SU-8-50-100-Datasheet-9.3.20-Final.pdf

    1st generation SU-8, thicker viscosity for thickness ranges 50-100um

  • KAM-SU-8-2000-2025-2100-Datasheet-4.9.21-final.pdf

    SU-8 2000 mid range of viscosities for 25-75um thicknesses

  • KAM-SU-8-3000-Datasheet-7.10-final.pdf
  • KAM-SU-8-TF-6000-Datasheet-1.2-3.pdf
  • KAM-KMPR®-1000-Data-Sheet-121619.pdf

    KMPR 1000 i-line photoresist is a high contrast, epoxy based photoresist that can be developed in conventional aqueous alkaline developer (TMAH) and readily stripped from the wafer.

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