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Ostemer 220 Litho

A single cure polymer (UV) optimized for good lithographic structuring and easy covalent surface modification.

Features and Benefits:

  • Photopatterning of 10-500 µm structures, at thicknesses ranging from < 10 µm to > 2mm.
  • Can be directly surface modified using active thiol-groups after patterning, e.g. to achieve desired wetting properties.
  • Can also be structured by various UV molding processes.