ma-N 2400
Man-N 2400 is a Negative Tone Photoresist series with e-beam and deep UV sensitive properties.
Pack Sizes and Applications:
100
ml
250
ml
500
ml
1000
ml
2500
ml
- Micro and nanoelectronics
- Semiconductor devices
- Mask for etching e.g. Si, SiO2, Si3N4 or various metals
- Ion implantation
- NIL stamp fabrication
Material Attributes:
- It is available in a wide range of viscosities
- It offers an excellent pattern resolution down to 30 nm
- It has high wet and dry etch resistance
- It has a good thermal stability and easy to remove
Manufacturer:
