ma-N 400
ma-N 400 is a negative tone photoresist series designed for the use in microelectronics and microsystems technology.
Pack Sizes and Applications:
100
ml
250
ml
500
ml
1000
ml
2500
ml
- Microelectronics
- Microsystems
- Mask for lift-off processes
- Can be used as an etch mask for semiconductors and metals
- Performs well with Implantation
Material Features:
- Available in a variety of viscosities
- Performs well as an etch mask exhibiting high dry and wet etch resistance
- Excellent for pattern transfer with PVD and lift-off processes
- Offers high quality electroplating characteristics (high stability in acid and alkaline plating baths)
- Offers good thermal stability of the resist patterns
- It is an aqueous alkaline development
- It is based on safe solvents
- It is easy to remove
Manufacturer:
