ma-P 1275
ma-P 1275 is a versatile high viscosity positive tone photoresist for microsystems technology.
Applications:
100
ml
250
ml
500
ml
1000
ml
2500
ml
- Mould for electroplating
- Etch mask for metal and semiconductor substrates – e.g. microlenses from reflowed patterns
- Mask for ion implantation
- Mould for UV moulding after reflow
Material Features:
- Specifically designed for electroplating of structures in microsystems technology
- High stability in acid and alkaline plating baths
- High dry and wet etch resistance
- Good thermal stability of the resist patterns attainable
- Aqueous alkaline development
- Easy to remove
- Sidewall angle up to 87° with mask aligner broadband exposure
- Suitable for pattern reflow
Manufacturer:
