Megaposit SPR3600 i-line Series Photoresist
A positive photoresist designed to deliver excellent lithographic performance.
Material Features:
- Designed for very high throughout process requirements.
- Has a high level of wet etch and thermal stability.
- Processes multi-wavelength capabilities, making it an ideal crossover photoresist allowing mix and match functions.
- L and M dyed products are ideal for reflective substrates.
- Dilutions enable it to cover resist thickness requirements from 1-4 microns, so a single resist family can meet all the process requirements.
- Applications: - Online, space and contact hole applications - Reflective Substrates.
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