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MICROPOSIT 351 Developer

MICROPOSIT 351 Developer is an aqueous alkaline solution for commercially available positive resists such as S1800 Series photoresist systems.

Pack Sizes and Applications:



  • Wafer Fabrication
  • Microelectronic

Material Features:

  • It has high process reliability, including across tight specifications, strict quality control and complete systems functional testing
  • It is optimised for wafer fabrication and other microelectronic applications where high speed and resolution are necessary
  • Like the 303A Developer, it has high differential solubility, high development tolerance and avoids photoresist swelling
  • High inspection yields enable clean, residue-feel development and works well with high process latitudes
  • Offers excellent exposure throughput