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mr I 8000R
  1. Excellent properties for thermal NIL
    • Short cycle times due to fast polymer flow
    • Sub-20 nm resolution
    • Low residual layer thickness
    • Low release forces
  2. Longer life-time of anti-sticking layers on the stamp
  3. High plasma etch resistance

Product Features:

  1. Excellent properties for thermal NIL
    • Short cycle times due to fast polymer flow
    • Sub-20 nm resolution
    • Low residual layer thickness
    • Low release forces
  2. Longer life-time of anti-sticking layers on the stamp
  3. High plasma etch resistance

Manufacturers