Nano-Strip®
Nano-Strip® is a stabilised formulation of sulfuric acid and hydrogen peroxide compounds.
Pack Sizes and Applications:
3.5
LITRES
- Semiconductor photolithography
Material Features:
- It is an adaptable formulation that removes positive and negative resists and other organic materials used in various semiconductor photolithography applications
- It contains high purity reagents required for high yield semiconductor manufacturing
Manufacturer:
