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SU-8 2000

SU-8 2000 is a high contrast, epoxy based photoresist designed for micromachining and other microelectronic applications, where a thick, chemically and thermally stable image is desired.

Pack Sizes and Applications:







  • Micromachining
  • Microelectronics
  • Permanent

Material Features:

  • It is an improved formulation of SU-8
  • Offers improved coating quality and increased process throughput thanks to the use of a faster drying, more polar solvent system
  • Available in 12 standard viscosities
  • Film thicknesses of 0.5->200 microns can be achieved with a single coat process
  • The exposed and subsequently thermally crosslinked portions of the film are rendered insoluble to liquid developers.
  • Has excellent imaging characteristics and is capable of producing very high aspect ratio structures.
  • SU-8 2000 has very high optical transmission above 360 nm, which makes it ideally suited for imaging near vertical sidewalls in very thick films.
  • SU-8 2000 is best suited for permanent applications where it is imaged, cured and left in place