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UV™ 5

UV™ 5 is a positive DUV photoresist.

Pack Sizes:





Material Features:

  • UV5 is designed to provide verticle profile imaging of isolated and semi-dense features.
  • It is optimised for device production design rules to 150 mm.
  • It is ideally suited for use with AR2 anti-reflectant and a variety of an inorganic substrates
  • It offers metal etch resistance equivalent to that of conventional i-Line photoresists
  • It provides high yielding device fabrivation via minimal sensitivity to PEB temperature variation (3nm/oC), superior etch resistance, wide process window and very low bias properties
  • UV5 is compatible with 0.26N developers (2.38% TMAH)