Join us for a webinar on December 10th 2025, at 2:30 PM CET.
The tenth "mrt webinar - Meet the Experts" in 2025 - our free one-hour online seminar series:
At Fraunhofer ENAS mask-based exposure technologies, in particular i-line stepper exposure, as well as e-beam lithography, are applied to generate 2.5/3D grayscale structures. Also, the combination of both exposure technologies in one resist layer was successfully investigated. Expert Sebastian Schermer from Fraunhofer ENAS will present patterning examples in ma-P 1200G positive grayscale resists and in mr-EBL 6000 negative resists. This webinar gives an overview of and a deeper insight into current possibilities and innovative applications, as well as the challenges of using these exposure technologies for grayscale patterning.
Please join us for the online seminar. More information and a constantly updated webinar agenda can be found here:
https://www.microresist.de/news/join-the-new-mrt-webinar-series-and-meet-the-experts/
We are looking forward to meeting you again, online!
Your MRT team
After registering, you will receive a confirmation email containing information about joining the webinar.
