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Update on greyscale lithography employing a novel positive photoresist for over 100 µm deep micropattern

Join us for a webinar on Jun 19, 2024 at 1:30 PM CEST.

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The sixth "mrt webinar - Meet the Experts" in 2024 - our free online seminar series:

In this webinar, we report on our latest investigations with the novel photoresist mr-P 22G designed to enable beyond 100 µm pattern depth in greyscale lithography. Our expert Dr. Christine Schuster will demonstrate that further process development in Direct Writing Lithography led to photoresist pattern depths of up to 165 µm in relevant pattern quality. The alternative approach based on UV exposure through dedicated greyscale photomasks will also be discussed. Finally, the pattern transfer of deep greyscale resist patterns into materials suitable for permanent application such as micro-optics will be showcased with different methods.

Micro resist technology has offered The online event series monthly since 2021. Each one-hour webinar consists of a presentation by one of our specialist colleagues or partners, followed by moderated questions and answers with the specialist.

Please join us for the online seminar. More information and a constantly updated webinar agenda can be found here: