Innovations in Greyscale Photoresists for 3D micro- and nanostructures
Technology innovations in greyscale lithography are currently fueled by the need to manufacture three-dimensional structures at micro and nanometer scale. The importance of the ability to create advanced surface topographies by means of photolithography with tailored photoresist concepts is market-driven during last decade due to its commercial application for example in micro-optics such as micro-lens arrays for mobile cameras or diffractive optical elements for Augmented and Virtual Reality glasses. The key challenge is to offer a holistic technical solution which comprises of equipment, material and processes - all well attuned to each other to overcome the increasing process complexity.
Our partner Micro Resist Technology GmbH supplies innovative photoresists and photopolymers for more than two decades. MRT uses its long-term strategic technological cooperation with renowned equipment providers to develop tailored photoresist solution which are specially matched to the lithographic equipment in order to offer industrial users an optimal solution. One fine example is the collaboration with Heidelberg Instruments GmbH (HIMT): In a joint effort, the technical limits to create a 3D pattern in a thick positive tone photoresist up to 60 µm and higher were pushed beyond the state-of-the-art by using HIMT’s direct laser writing tools in combination with MRT’s low-contrast positive tone photoresist ma-P1200G – see picture xxx.
An overview of the special photoresist and process capabilities were summarized in the first issue of HIMT’s biannual magazine “The Lithographer” with an Expert-Know contribution by our partner MRT which can be found by Clicking Here