MICROPOSIT MF CD-26 Developer is a 0.26N Surfactant Free product that offers high Photospeed and improved processing latitude for Conventional and Advanced Photoresists. MF CD-26 is effective across various resist technologies including g/h/i line, KrF and ArF. MF CD-26 is a TMAH based Developer designed to be Metal Ion Free to avoid potential sources of Metal Ion Contamination.MF CD-26 works well in Spray, Spray-Puddle, and Immersion processes.

MEGAPOSIT MF-20A series Developers are surfactant containing developers, designed to provide improved process latitude for both conventional and advanced resists over a wide range of developer normalities.

MICROPOSIT MF-300 series Developer has a range of products in the family that offer high photospeed and good processing latitude for high density device fabrication. This TMAH based Developer is compatible with conventional novolac based positive photo resist systems. MICROPOSIT MF-300 series developers are specifically formulated to work with a wide range of Rohm & Haas positive photo resists including MICROPOSIT S1800 and MICROPOSIT SPR3000 series photo resists. If unexposed resist loss (URL) is desired then MICROPOSIT MF-319 should be used. If a higher throughput process is desired MICROPOSIT MF-322 is recommended for use on in-line track systems or immersion processing equipment.