Low Stress Dielectric Photoresist capable of
3-10µm in a single spin
No warpage due to low shrinkage and tensile modulus
i-Line/broadband sensitivity, 1:1 aspect ratio imaging
Low-temperature processing (< 200°C)
Good electrical properties
High thermal and chemical stability
Low moisture uptake
Passivation and protective layers
Cyclotene 3000 Series
The CYCLOTENE™ 3000 Series Advanced Electronics Resins derived from B-staged bisbenzocyclobutene (BCB) monomers are dry-etch grades of the CYCLOTENE family of products and were developed for use as spin-on dielectric materials in microElectronics device fabrication. The CYCLOTENE Resins are low dielectric constant and low dielectric loss materials and feature low moisture absorption, no out-gassing, low-temperature cure and excellent planarization. The CYCLOTENE Resins have been widely adopted in a variety of Electronics applications, including silicon and compound semiconductor passivation, interlayer dielectric, flat panel displays, IC packaging, integrated passives, MEMS, wafer bonding and 3D integration, and optoelectronic components. There are four formulations of the CYCLOTENE 3000 Series products which are commercially available from A-Gas EM. An additional dry etch product, XUS 35077.00 type 02, was designed for flat panel display applications.
Please contact Dave.Shaw@agas.com for further information on that product.
Cyclotene 4000 Series (Double puddle processing)
The CYCLOTENE™ 4000 Series Advanced Electronics Resins are I-line-, G-line-, and broad band-sensitive photopolymers that have been developed for use as dielectrics in thin film microElectronicss applications. These polymers are derived from B-staged bisbenzocyclobutene (BCB) chemistry and have final film properties that are similar to the dry etchable 3000 series. Products are listed in Table 1. Note that, for the thicker and thinner XUS products, the DS2100 develop process described in this guide is possible but immersion develop with D3000 is preferred. Please see our related immersion develop processing guide for more details on this process. Properties of CYCLOTENE Resins are shown in Tables 2-4 and Figure 1. Additional information on CYCLOTENE Resins can be found on the web site, www.cyclotene.com
Cyclotene 4000 Series (Immersion processing)
The CYCLOTENE™ 4000 Series Advanced Electronics Resins are I-line-, G-line-, and broad band-sensitive photopolymers that have been developed for use as dielectrics in thin film microElectronicss applications. These polymers are derived from B-staged bisbenzocyclobutene (BCB) chemistry and have final film properties that are similar to the dry etchable 3000 series. Additional information on CYCLOTENE Resins can be found on the web site, www.cyclotene.com.
The CYCLOTENE 6505 advanced electronic resins are I-line-, G-line-, and broadband-sensitive
photopolymers that have been developed for use as dielectrics in thin-film microelectronics applications.
The polymers are based on B-staged aqueous developable bis-benzocyclobutene (ADBCB) chemistry, and
have final film properties that are similar to legacy CYCLOTENE 4000 and CYCLOTENE 3000 series.
CYCLOTENE 6505 is TMAH developable, enabling high resolution and multilayer stack build dielectric
Cyclotene XUS 35077
CYCLOTENE™ XUS 35077.00 Type 02 (BCB) Advanced Electronics Resin is a resin formulation designed for dielectric and planarization applications which require excellent gap fill and planarization while delivering an isotropic low dielectric constant. When properly applied, BCB films can reliably replace PECVD silicon nitride (SiNx) passivation on back channel etch TFT designs facilitating production cost reduction and higher throughput. When properly cured, a 3μm BCB film has equivalent transparency to a 0.25μm SiNx film. The low dielectric constant of BCB films (ε = 2.65) compared to SiNx (ε = 7-9) facilitating significant reductions in capacitive coupling between pixel electrodes and metal business, improving picture quality and increasing aperture ratio. The high level of planarization provided by BCB films reduces disclinations at the pixel edge and improves the reproducibility of the alignment layer rubbing process. This application note describes general coating, curing, and etching conditions for CYCLOTENE XUS 35077.00 Resin.