SU-8 Resists

Chemically amplified Epoxy-based Negative Photoresist capable of 0.5 -> 100µm in a single-spin @ 3000rpm

Material Attributes:

i-line processing

High aspect ratio with vertical sidewalls

Photo-definable ultra thick structures

Outstanding thermal and chemical stability

Excellent dry etch resistance

Applications:

Optoelectronics

DRIE etch mask

MEMS

Microfluidics

Displays