Eagle™ 2100 ED Photoresist
Eagle™ 2100 ED Photoresist is a photo-imageable negative-working coating that is electrodeposited from an aqueous emulsion.
- Developed primarily for the manufacture of fine-line MLB Innerlayers and other applications where a thin, uniform, chemically- resistant photoresist film is desired
- The coating withstands common acid and alkaline etchants and plating solutions
- Eagle™ 2100 ED Photoresist is cataphoretically deposited onto electrically-conductive substrates regardless of shape or geometric complexity
- After coating, Eagle™ 2100 ED Photoresist is imaged using actinic radiation at wavelengths employed for common CBT photolithographic processes.