HSQ Resist
HSQ resists are high-purity, negative tone resists developed for advanced lithography processes including EBL, EUV and nanoimprint.
Available formats
- Ready-to-use liquid resist
- Powder for custom dilution
- Dilution kits with improved shelf life
- Bespoke concentrations available
Material Features
- Concentration range: 1% to 45%
- Excellent line edge roughness
- High Resolution
- Available in several pack sizes, including low volume options
- Customisable solutions
- Clear handling and dilution guidance provided
- Fast turnaround and improved availability
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