MICROPOSIT MF-300 Series Developer
MICROPOSIT MF-300 Series Developer offers a range of products with high photo speed and good processing latitude for high density device fabrication.
- As a TMAH-based developer, it is compatible with conventional novolac-based positive photo resist systems
- MICROPOSIT MF-300 series developers are specifically formulated to work with a wide range of Rohm & Haas positive photo resists including MICROPOSIT S1800 and MICROPOSIT SPR3000 series
- If unexposed resist loss (URL) is desired then MICROPOSIT MF-319 should be used
- If a higher throughput process is desired MICROPOSIT MF-322 is recommended for use on in-line track systems or immersion processing equipment