mr I 8000R
- Excellent properties for thermal NIL
• Short cycle times due to fast polymer flow
• Sub-20 nm resolution
• Low residual layer thickness
• Low release forces - Longer life-time of anti-sticking layers on the stamp
- High plasma etch resistance
Product Features:
- Excellent properties for thermal NIL
• Short cycle times due to fast polymer flow
• Sub-20 nm resolution
• Low residual layer thickness
• Low release forces - Longer life-time of anti-sticking layers on the stamp
- High plasma etch resistance