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Nanoimprint Lithography

Ready-to-use Formulations for Thermal & Photo (UV) Nanoimprint Lithography (NIL)

Pack Sizes:

100

ml

250

ml

500

ml

1000

ml

2500

ml

Features and Benefits:

  • Ready-to-use Formulations for Thermal & Photo (UV) Nanoimprint Lithography (NIL)
  • Coating of various substrates with excellent film quality (Si, SiO2, glass, Al, Al2O3, plastics)
  • Excellent pattern replication fidelity using various mold materials (Si, SiO2, Ni, OrmoStamp┬«)
  • Superior mold release properties
  • Numerous application areas (pattern transfer using dry etch processes, permanent applications)
  • Customized solutions and resist formulations designed for industrial high throughput processes
  • Safe solvents specified for industrial requirements
  • Guaranteed product quality and processing reproducibility
  • Manufacturing according to ISO 9001 and ISO 14001

Manufacturer: