PMGI/LOR
PMGI/LOR are Lift-off Resists designed for Metal Disposition Processing.
Pack Sizes and Applications:
500
ml
1
LITRE
4
LITRES
- Data storage
- III-V Semiconductors
- Optoelectronics
- Wireless ICs
- MEMs
Material Features:
- PMGI/LOR won't intermix when over-coated with most imaging resists
- It has a high thermal stability; Tg> 195oC
- It offers single step development of bi-layer stack in TMAH or KOH developers
- It removes quickly and cleanly in conventional resist strippers
- It enables high productivity in sub-0.25µm micron bi-layer resist imaging
- It offers high yield, very thick (>3µm) metal lift-off processing
- These resists are available in a wide variety of formularies to meet almost any customer requirements.
Manufacturer:
