SML Resist
SML resist is a positive tone resist that has been specifically designed for electron beam lithography.
It is a polymer that can be processed in exactly the same way as other polymer resists such as PMMA or ZEP. SML provides the user with a high-resolution, high-aspect-ratio positive-tone resist. It has excellent dry etch selectivity and can be processed with standard cleanroom chemistry.
Material Features
- Film thickness
- 0.5 - 5μm
- Very high aspect ratio
- Very high resolution
- Excellent etch selectivity
Manufacturer:
