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SML Resist

SML resist is a positive tone resist that has been specifically designed for electron beam lithography.
It is a polymer that can be processed in exactly the same way as other polymer resists such as PMMA or ZEP. SML provides the user with a high-resolution, high-aspect-ratio positive-tone resist. It has excellent dry etch selectivity and can be processed with standard cleanroom chemistry.

 

 

Material Features

  • Film thickness
  • 0.5 - 5μm 
  • Very high aspect ratio
  • Very high resolution
  • Excellent etch selectivity

Manufacturer:

EM Resist LTD logo