SPR350 is an advanced mid-critical photoresist designed to give high throughput.
Pack Sizes and Applications
- Line/Space, Trench and ContactHole
- Various substrates including Silicon, Silicon-Dioxide, Nitride (SiN) and relfective Polysilicon/Metal
- It is developed as a multi-wavelength, all-purpose photoresist ideal for mix and match applications.
- Its product family is PFOS free and is available in both dyed and un-dyed versions.
- It offers excellent resolution with very good feature profiles for Line/Space, Trench and ContactHole applications.
- It performs well with Dry Etch, Wet Etch and Implant processes
- It can also be used as a consolidation photoresist