UV™26 is a positive DUV photoresist with low viscosity, developed for deep implant lithographic applications.
Pack Sizes and Applications:
- General Lithography: Positive DUV Resists
- It offers reduces dispense volume thanks to low viscosity
- UV26 has improved coating uniformity for films ranging from 1-3.0 µm
- It has a high thermal stability of 150oC
- It performs well with a range of ancillaries, including CD-26 Developer, Remover 1165, EBR-10A Edge Bead Remover