UV™ 5

Pack Sizes:

QUARTS

GALLONS

Material Features:

UV5 is designed to provide verticle profile imaging of isolated and semi-dense features.
It is optimised for device production design rules to 150 mm.
It is ideally suited for use with AR2 anti-reflectant and a variety of an inorganic substrates
It offers metal etch resistance equivalent to that of conventional i-Line photoresists
It provides high yielding device fabrivation via minimal sensitivity to PEB temperature variation (3nm/oC), superior etch resistance, wide process window and very low bias properties
UV5 is compatible with 0.26N developers (2.38% TMAH)

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