AR14L DUV Anti-Reflectant is an organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresists. It is designed to provide an anti-reflective surface for low-temperature resist platforms. AR14L is available in various dilutions to accommodate varying topographic challenges.

AR10L DUV Anti-Reflectant is an organic, thermally cross-linking bottom anti-reflectant for 248 nm (KrF) photoresists. It is designed to provide a universal anti-reflective surface for high and low-temperature resist platforms and offers excellent compatibility with most ESCAP, HYBRID and Acetal resists. AR10L is a conformal 1st min 248nm anti-reflectant and is typically used in the range of 400 - 1200 Angstroms over transparent thin films on reflective substrates. Due to the wide range of resist compatibility that AR10L offers it makes it an ideal candidate for a consolidation BARC product