Negative Photoresists
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Negative Photoresists
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ma-N-400-ma-N-1400-series_PI_ma-N_400_1400_2015.pdf
ma-N 400 and ma-N 1400 - Negative Tone Photoresists. Conventional Pattern Transfer and Single-Layer Lift-Off
Unique features
High wet and dry etch resistance
Good thermal stability of the resist pattern
Tunable pattern profile: vertical to undercut
Aqueous alkaline development
Easy to remove
Resists available in a variety of viscosities -
ma-N-2400-mr-EBL-6000-series_PI_ma-N_2400_mr-EBL_6000_2015_0.pdf
ma-N 2400 and mr-EBL 6000 - Negative Tone Photoresists for thin Film E-beam or Deep UV Lithography
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mr-DWL-series_PI_mr_DWL_2019.pdf
mr-DWL — Negative Tone Photoresist Series for Direct Laser Writing (DLW) @ 405 nm & Two-Photon Polymerization (2PP)
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PI_EpoCore_Clad_2019_0-2.pdf
EpoCore & EpoClad - Negative Tone Photoresist Series for manufacture of optical single-mode (SM) & multi-mode (MM) waveguides
