Positive Photoresists
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Positive Photoresists
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ma-P-1200_PI_map1200_2015_0.pdf
ma-P 1200 — Positive Tone Photoresist Series
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ma-P-1275-ma-P-1275HV_PI_maP1275_hv_2015_1.pdf
ma-P 1275 and ma-P 1275HV – Positive Tone Photoresists
Versatile high viscosity positive tone photoresists for microsystems technology
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PI_maP1200G.pdf
Positive Greyscale Photoresist Series
Positive tone photoresist series specifically designed for the requirements of greyscale lithography. An application in standard binary lithography is also possible.
– Reduced contrast
– Film thickness up to 60 µm and higher
– 50 - 60 µm depth range of the patterns possible
in greyscale lithography
– Spectral sensitivity 350…450 nm
– High intensity laser exposure possible without outgassing
– Aqueous alkaline development, for greyscale lithography with TMAH based developers, for standard binary lithography also with metal ion bearing developers
– Suitable for electroplating
– Suitable for dry etch processes e.g. with CHF3
, CF4, SF6
– Suitable for pattern reflow after standard binary lithography -
mr-PosEBR-Seriemr-PosEBR_product_information_0.pdf
mr-PosEBR – Positive Tone Electron-Beam Resist Series
Resists for high resolution electron-beam lithography
