Positive Greyscale Photoresist Series

Positive tone photoresist series specifically designed for the requirements of greyscale lithography. An application in standard binary lithography is also possible.
– Reduced contrast
– Film thickness up to 60 µm and higher
– 50 - 60 µm depth range of the patterns possible
in greyscale lithography
– Spectral sensitivity 350…450 nm
– High intensity laser exposure possible without outgassing
– Aqueous alkaline development, for greyscale lithography with TMAH based developers, for standard binary lithography also with metal ion bearing developers
– Suitable for electroplating
– Suitable for dry etch processes e.g. with CHF3
, CF4, SF6
– Suitable for pattern reflow after standard binary lithography