Ostemer 220 Litho
A single cure polymer (UV) optimized for good lithographic structuring and easy covalent surface modification.
Features and Benefits:
- Photopatterning of 10-500 µm structures, at thicknesses ranging from < 10 µm to > 2mm.
- Can be directly surface modified using active thiol-groups after patterning, e.g. to achieve desired wetting properties.
- Can also be structured by various UV molding processes.
Manufacturer:
