Ma-P 12000 G
Ma-P 12000 G is a positive tone photoresist series specifically designed to be used in greyscale lithography. It can cover a wide range of pattern depths and can also be applied in standard binary lithography.
Pack Sizes and Applications:
100
ml
250
ml
500
ml
1000
ml
2500
ml
- MEMs
- MOEMS
- Micro-optics
- Displays
- Can be used for pattern transfer in UV moulding, etching and electroplating applications
Material Features:
- It offers a reduced contrast
- It performs well with film thicknesses of 60um and higher
- It has a spectral sensitivity of 350-450nm
- It can be exposed to high intensity lasers without outgassing
- It can be used for dry etch processes including CHF3, CH4 and SF6
- Performs well when used for pattern reflow after standard binary lithography
- Offers Acqueous alkaline development with TMAH-based developers; it can be used with metal ion bearing developers for standard binary lithography
Manufacturer:
