MICROPOSIT 351 Developer

MICROPOSIT 351 Developer is an aqueous alkaline solution for commercially available positive resists such as S1800 Series photoresist systems.

Pack Sizes and Applications:

GALLONS

It has high process reliability, including across tight specifications, strict quality control and complete systems functional testing
It is optimised for wafer fabrication and other microelectronic applications where high speed and resolution are necessary
Like the 303A Developer, it has high differential solubility, high development tolerance and avoids photoresist swelling
High inspection yields enable clean, residue-feel development and works well with high process latitudes
Offers excellent exposure throughput