The mr-NIL200 series are photo-curable NIL resist formulations specifically developed for UV nanoimprint lithography (UV-NIL) applying gas-impermeable stamp materials. The typical application field of mr-NIL200 is the use as an etch mask in pattern transfer processes e.g. photonic applications via reactive ion etching approaches. The mr-NIL200 series is available as ready-to-use formulations and works without the need for any additional adhesion promoter or primer.
Product Features:
The mr-NIL200 series are photo-curable NIL resist formulations specifically developed for UV nanoimprint lithography (UV-NIL) applying gas-impermeable stamp materials. The typical application field of mr-NIL200 is the use as an etch mask in pattern transfer processes e.g. photonic applications via reactive ion etching approaches. The mr-NIL200 series is available as ready-to-use formulations and works without the need for any additional adhesion promoter or primer.
Manufacturers:
