mr NIL 6000E
- Excellent film quality on various substrate materials, e.g. Si, SiO2, Al, Al2O3
- Designed for combined thermal and UV nanoimprint Lithography
- Tg 1 °C before curing
- Imprinting, curing by UV flood exposure during imprinting, and mould release at the same temperature
- Imprint temperature of 65 °C
- Very low residual layer thickness < 10 nm
- Excellent pattern transfer fidelity
- High plasma etch resistance
- Ready-to-use solutions
- Safe solvents
Product Features:
- Excellent film quality on various substrate materials, e.g. Si, SiO2, Al, Al2O3
- Designed for combined thermal and UV nanoimprint Lithography
- Tg 1 °C before curing
- Imprinting, curing by UV flood exposure during imprinting, and mould release at the same temperature
- Imprint temperature of 65 °C
- Very low residual layer thickness < 10 nm
- Excellent pattern transfer fidelity
- High plasma etch resistance
- Ready-to-use solutions
- Safe solvents
Manufacturers:
